Specific Process Knowledge/Etch/Etching of Chromium: Difference between revisions
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Wet etching of chromium at Danchip is done making your own set up in a beaker in a fume hood - preferably in cleanroom 2 or 4. We have two solution for this: | Wet etching of chromium at Danchip is done making your own set up in a beaker in a fume hood - preferably in cleanroom 2 or 4. We have two solution for this: | ||
# HNO< | # HNO<sub>3</sub>:H<sub>2</sub>O:cerisulphate - 90ml:1200ml:15g - standard at Danchip | ||
# Commercial chromium etch | # Commercial chromium etch | ||
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#Add a little water while stirring - make sure all lumps are gone. | #Add a little water while stirring - make sure all lumps are gone. | ||
#Add water until 600 ml - keep stirring (use magnetic stirring) | #Add water until 600 ml - keep stirring (use magnetic stirring) | ||
#Add 90 ml HNO< | #Add 90 ml HNO<sub>3</sub> | ||
#When the cerisulphate is completely dissolved (clear liquid) you can add the other 600 ml of wafer. | #When the cerisulphate is completely dissolved (clear liquid) you can add the other 600 ml of wafer. | ||
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| '''Chemical solution''' | | '''Chemical solution''' | ||
|HNO< | |HNO<sub>3</sub>:H<sub>2</sub>O:cerisulphate - 90ml:1200ml:15g | ||
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== Dry etching of chromium == | == Dry etching of chromium == | ||
On the [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch]] tool a recipe for chromium is being developed. | On the [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch]] tool a recipe for chromium is being developed. | ||