Specific Process Knowledge/Etch/Etching of Chromium: Difference between revisions
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Wet etching of chromium at Danchip is done making your own set up in a beaker in a fume hood - preferably in cleanroom 2 or 4. We have two solution for this: | Wet etching of chromium at Danchip is done making your own set up in a beaker in a fume hood - preferably in cleanroom 2 or 4. We have two solution for this: | ||
# HNO< | # HNO<sub>3</sub>:H<sub>2</sub>O:cerisulphate - 90ml:1200ml:15g - standard at Danchip | ||
# Commercial chromium etch | # Commercial chromium etch | ||
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#Add a little water while stirring - make sure all lumps are gone. | #Add a little water while stirring - make sure all lumps are gone. | ||
#Add water until 600 ml - keep stirring (use magnetic stirring) | #Add water until 600 ml - keep stirring (use magnetic stirring) | ||
#Add 90 ml HNO< | #Add 90 ml HNO<sub>3</sub> | ||
#When the cerisulphate is completely dissolved (clear liquid) you can add the other 600 ml of wafer. | #When the cerisulphate is completely dissolved (clear liquid) you can add the other 600 ml of wafer. | ||
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| '''Chemical solution''' | | '''Chemical solution''' | ||
|HNO< | |HNO<sub>3</sub>:H<sub>2</sub>O:cerisulphate - 90ml:1200ml:15g | ||
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== Dry etching of chromium == | == Dry etching of chromium == | ||
On the [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch]] tool a recipe for chromium is being developed. | On the [[Specific Process Knowledge/Etch/ICP Metal Etcher|ICP Metal Etch]] tool a recipe for chromium is being developed. | ||
Revision as of 08:47, 18 October 2012
Ething of Chromium can be done either wet or dry. For wet etching please see below on this page. Dry etching can be done either with ICP using Chlorine chemistry or with IBE by sputtering with Ar ions.
Wet etching of Chromium
Wet Etch of Chromium can take place in a beaker in this fume hood
Wet etching of chromium at Danchip is done making your own set up in a beaker in a fume hood - preferably in cleanroom 2 or 4. We have two solution for this:
- HNO3:H2O:cerisulphate - 90ml:1200ml:15g - standard at Danchip
- Commercial chromium etch
Etch rate are depending on the level of oxidation of the metal.
How to mix the Chromium etch 1:
- Take a beaker and add 15g of cerisulphate.
- Add a little water while stirring - make sure all lumps are gone.
- Add water until 600 ml - keep stirring (use magnetic stirring)
- Add 90 ml HNO3
- When the cerisulphate is completely dissolved (clear liquid) you can add the other 600 ml of wafer.
Overview of the data for the chromium etches
| Chromium etch 1 | Chromium etch 2 | |
|---|---|---|
| General description |
Etch of chromium |
Etch of chromium |
| Chemical solution | HNO3:H2O:cerisulphate - 90ml:1200ml:15g | . |
| Process temperature | Room temperature | . |
| Possible masking materials |
Photoresist (1.5 µm AZ5214E) |
. |
| Etch rate |
~40-100 nm/min |
. |
| Batch size |
1-25 wafers at a time |
. |
| Size of substrate |
4" wafers |
. |
| Allowed materials |
No restrictions. Make a note on the bottle of which materials have been processed. |
. |
Dry etching of chromium
On the ICP Metal Etch tool a recipe for chromium is being developed.