Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions
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! Etch rate (nm/min) | ! Etch rate (nm/min) | ||
| | | ~40 | ||
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!Zep520A resist selectivity | !Zep520A resist selectivity | ||
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==Etching of nanostructures in silicon using the ICP Metal Etcher== | ==Etching of nanostructures in silicon using the ICP Metal Etcher== | ||