Specific Process Knowledge/Lithography/EBeamLithography/HSQ Dose Test: Difference between revisions
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SEM images were recorded and analyzed from the structure shown below: | SEM images were recorded and analyzed from the structure shown below: | ||
[[File:design.png|frameless||left]] | [[File:design.png|frameless||left]] | ||
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The measured and designed critical dimension are plotted vs the doses below: | The measured and designed critical dimension are plotted vs the doses below: | ||
[[File:CD vs dose.png|frameless|446x446px|dose test optical images|left]] | [[File:CD vs dose.png|frameless|446x446px|dose test optical images|left]] | ||
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The line width roughness (LWR) is plotted vs CD below: | The line width roughness (LWR) is plotted vs CD below: | ||
[[File:LWR vs CD.png|frameless|462x462px|dose test optical images|left]] | [[File:LWR vs CD.png|frameless|462x462px|dose test optical images|left]] | ||