Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions
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[[image:SEM-FEI-1.jpg|200x200px|right|thumb|The FEI SEM has its own dedicated room: Cleanroom 10]] | [[image:SEM-FEI-1.jpg|200x200px|right|thumb|The FEI SEM has its own dedicated room: Cleanroom 10]] | ||
The [[/FEI|FEI SEM]] has been acquired to cope with the growing need for polymer and e-beam related imaging. It is | The [[/FEI|FEI SEM]] has been acquired to cope with the growing need for polymer and e-beam related imaging. It is an extremely versatile microscope with two vacuum modes (High Vacuum and Low Vacuum) and 7 different detectors, offering excellent resolution on any type of sample or material. This great performance, however, requires a skilled operator that knows how to achieve it. Also, we have learned that the high degree of sophistication and the great number of detectors make it much less robust compared to the other SEM's. It is therefore the intention that only users with special needs (for instance thick polymers, glass substrates or EDX/micromanipulator experiments) that will be trained. Furthermore, the instrument is equipped with a Oxford Inca EDX system and a Kleindiek micromanipulator with a Capres 4 point probe. | ||
The [[/Zeiss|Zeiss SEM]] is the newest SEM in the cleanroom. | |||
[[image:SEM-Jeol.jpg|200x200px|right|thumb|The Jeol SEM is located outside the cleanroom in the basement ]] | [[image:SEM-Jeol.jpg|200x200px|right|thumb|The Jeol SEM is located outside the cleanroom in the basement ]] | ||
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[[/Jeol|Jeol SEM]] | [[/Jeol|Jeol SEM]] | ||
''The less advanced [[/Jeol|Jeol SEM]] offers a great alternative for many types of SEM needs. If you have to check the result of an etch process, a lift-off etc. before you proceed with the process sequence, the [[/Jeol|Jeol SEM]] is a much better choice. It is simple, faster to use, has a very low sample exchange time and is by far more accessible than any of the other SEMs. There is a very good chance that it is free when you need it. On heavily charging polymers such as SU-8 it even does a better job than the Leo SEM. To use it, a 1-2 hour training session is necessary.'' | ''The less advanced [[/Jeol|Jeol SEM]] offers a great alternative for many types of SEM needs. If you have to check the result of an etch process, a lift-off etc. before you proceed with the process sequence, the [[/Jeol|Jeol SEM]] is a much better choice. It is simple, faster to use, has a very low sample exchange time and is by far more accessible than any of the other SEMs. There is a very good chance that it is free when you need it. On heavily charging polymers such as SU-8 it even does a better job than the Leo SEM. To use it, a 1-2 hour training session is necessary.'' | ||
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|- | |- | ||
!Model | !Model | ||
| | |Zeiss Supra 55 VP | ||
|FEI Nova 600 NanoSEM | |FEI Nova 600 NanoSEM | ||
|Leo 1550 SEM | |Leo 1550 SEM | ||
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|- | |- | ||
!Electron emitter type | !Electron emitter type | ||
| | |FEG (Field Emission Gun) | ||
|FEG (Field Emission Gun) | |FEG (Field Emission Gun) | ||
|FEG (Field Emission Gun) | |FEG (Field Emission Gun) | ||
|Tungsten filament | |Tungsten filament | ||
|- | |- | ||
!Vacuum modes | !Vacuum modes | ||
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|Fast in-process imaging | |Fast in-process imaging | ||
|- | |- | ||
!EDX analysis | |||
| | | | ||
| | |Oxford Inca system | ||
| | |Röntec system | ||
| | |Not available | ||
|- | |- | ||
|} | |} | ||