Specific Process Knowledge/Thin film deposition/Temescal: Difference between revisions
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== Process information == | == Process information == | ||
[[/Acceptance Test|Acceptance Test information is found here]]. Describes tests of '''thickness uniformity''', '''side wall deposition''', '''sheet resistance''', and '''use of the ion source'''. | [[/Acceptance Test|'''Acceptance Test information is found here''']]. Describes tests of '''thickness uniformity''', '''side wall deposition''', '''sheet resistance''', and '''use of the ion source'''. | ||
===Materials available in the E-beam evaporator (Temescal)=== | ===Materials available in the E-beam evaporator (Temescal)=== | ||
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===Particulates in the films=== | ===Particulates in the films=== | ||
Read about optimizing film quality including how to minimize the number of [[/Particulates in Temescal Au films|particulates in Au films in the Temescal]]. | Read about optimizing film quality including how to minimize the number of [[/Particulates in Temescal Au films|particulates in Au films in the Temescal]]. | ||
==Ion source== | |||
[[/Ion source in E-beam evaporator (Temescal)|Information on the ion source]]. | |||
==Equipment performance and process related parameters for the Temescal E-beam evaporator== | ==Equipment performance and process related parameters for the Temescal E-beam evaporator== | ||