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{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
|+ '''Process A specifications'''
|+ '''Process C specifications'''
|-
|-
! Parameter
! Parameter
Line 52: Line 52:


{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
|+ '''Process A recipe'''
|+ '''Process C recipe'''
|-
!
! colspan="2" | Step 1
! colspan="2" | Step 2
|-
|-
! width="120" | Parameter   
! width="120" | Parameter   
! width="120" | Etch
! width="120" | Etch
! width="120" | Dep
! width="120" | Etch
! width="120" | Dep
|-
|-
! Gas flow (sccm)  
! Gas flow (sccm)  
| SF<sub>6</sub> 350 (1.5 s) 550
| SF<sub>6</sub> 38 C<sub>4</sub>F<sub>8</sub> 70
| C<sub>4</sub>F<sub>8</sub> 200
| SF<sub>6</sub> 350 (1.5 s) 550
| C<sub>4</sub>F<sub>8</sub> 200
|-
|-
! Cycle time (secs)  
! Process time (mm:ss)  
| 7.0
| 01:30
| 4.0
| 7.0
| 4.0
|-
|-
! Pressure (mtorr)  
! Pressure (mtorr)  
| 25 (1.5 s) 90 >> 150
| 4
| 25
| 25 (1.5 s) 150
| 25
|-
|-
! Coil power (W)  
! Coil power (W)  
| 2800
| 450
| 2000
| 2800
| 2000
|-
|-
! Platen power (W)
! Platen power (W)
| 120 >> 140 (1.5) 45
| 100
| 0
| 140 (1.5) 45
| 0
|-
! Cycles 
| colspan="2" | 11 (keep fixed)
| colspan="2" | 44 (vary this)
|-
|-
! Common  
! Common  
| colspan="4" | Temperature 20 degs, HBC 10 torr, Short funnel, with baffle & 5mm spacers
| colspan="4" | Temperature 10 degs, HBC 10 torr, long funnel, with baffle & 100 mm spacers
|}
|}
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