Specific Process Knowledge/Lithography/EBeamLithography/2D detection system: Difference between revisions

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 == Execution ==
+Execution is like usual by either running SETWFR or CHIPAL. During execution the system will make imagescans with the chosen detector and compare the resulting image with the reference file. If the match is accepted, the system will continue to the next mark. Below is the result of our example.
+{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
+|-
+| [[image:2Droughscan.png|400px]] || [[image:2Dfinescan.png|400px]]
+|-
+| colspan="2" style="text-align:enter;|
+Imagescans obtained during alignment. Rough alignment scan (left) is 1000 µm while fine scan (right) is 10 µm. The green cross indicates the center as determined by the system.
+|}