Specific Process Knowledge/Lithography/EBeamLithography/2D detection system: Difference between revisions

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-| [[image:PQRef1000mu.png|400px]]
+| [[image:PQRef1000mu.png|300px]]
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-Imagescans obtained during alignment. Rough alignment scan (left) is 1000 µm while fine scan (right) is 10 µm. The green cross indicates the center as determined by the system.
+Alignment mark used in this example. The mark is 1000 µm in both directions.
 |}