Specific Process Knowledge/Lithography/EBeamLithography/2D detection system: Difference between revisions
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{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | {| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | ||
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| [[image:2Droughscan.png| | | [[image:2Droughscan.png|400px]] || [[image:2Dfinescan.png|400px]] | ||
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| colspan="2" style="text-align:enter;| | | colspan="2" style="text-align:enter;| | ||
Imagescans obtained during alignment. Rough alignment scan (left) is 1000 µm while fine scan (right) is 10 µm. The green cross indicates the center as determined by the system. | Imagescans obtained during alignment. Rough alignment scan (left) is 1000 µm while fine scan (right) is 10 µm. The green cross indicates the center as determined by the system. | ||
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