Specific Process Knowledge/Etch/DRIE-Pegasus/processB: Difference between revisions

From LabAdviser
Jml (talk | contribs)
New page: {| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" |+ '''Process A specifications''' |- ! Parameter ! Specification ! Average result |- ! Etch rate (µm/min) | > 1...
 
Jml (talk | contribs)
No edit summary
Line 1: Line 1:
{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
|+ '''Process A specifications'''
|+ '''Process B specifications'''
|-
|-
! Parameter
! Parameter
Line 7: Line 7:
|-
|-
! Etch rate (µm/min)   
! Etch rate (µm/min)   
| > 15
| > 10
| 18.9
| 10.7
|-
|-
! Etched depth (µm)
! Etched depth (µm)
| 150
| 100
| 189.1
| 107
|-
|-
! Scallop size (nm)
! Scallop size (nm)
| < 800
| < 800
| 718
| 685
|-
|-
! Profile (degs)
! Profile (degs)
| 91 +/- 1
| 91 +/- 1
| 91.1
| 90.7
|-
|-
! Selectivity to AZ photoresist  
! Selectivity to AZ photoresist  
| > 150
| > 100
| 310
| 183
|-
|-
! Undercut (µm)
! Undercut (µm)
| <1.5
| <1.5
| 0.84
| 0.89
|-
|-
! Uniformity (%)
! Uniformity (%)
Line 36: Line 36:
! Repeatability (%)
! Repeatability (%)
| <4
| <4
| 0.43
| 0.47
|-
|-
|}
|}
Line 44: Line 44:


{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;"
|+ '''Process A recipe'''
|+ '''Process B recipe'''
|-
|-
!  
!  

Revision as of 10:18, 5 July 2011

Process B specifications
Parameter Specification Average result
Etch rate (µm/min) > 10 10.7
Etched depth (µm) 100 107
Scallop size (nm) < 800 685
Profile (degs) 91 +/- 1 90.7
Selectivity to AZ photoresist > 100 183
Undercut (µm) <1.5 0.89
Uniformity (%) < 3.5 3.0
Repeatability (%) <4 0.47



Process B recipe
Step 1 Step 2
Parameter Etch Dep Etch Dep
Gas flow (sccm) SF6 350 (1.5 s) 550 C4F8 200 SF6 350 (1.5 s) 550 C4F8 200
Cycle time (secs) 7.0 4.0 7.0 4.0
Pressure (mtorr) 25 (1.5 s) 90 >> 150 25 25 (1.5 s) 150 25
Coil power (W) 2800 2000 2800 2000
Platen power (W) 120 >> 140 (1.5) 45 0 140 (1.5) 45 0
Cycles 11 (keep fixed) 44 (vary this)
Common Temperature 20 degs, HBC 10 torr, Short funnel, with baffle & 5mm spacers