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Specific Process Knowledge/Etch/DRIE-Pegasus: Difference between revisions

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Bureaucrats, danchip, Administrators
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Jml (talk | contribs)
Bureaucrats, danchip, Administrators
1,918 edits
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|-
|-
!  
!  
! colspan="2" align="center"| Step 1
! colspan="2" | Step 1
! colspan="2" align="center"| Step 2  
! colspan="2" | Step 2  
|-
|-
! width="120" align="center" | Parameter   
! width="120" | Parameter   
! width="120" align="center" | Etch
! width="120" | Etch
! width="120" align="center" | Dep
! width="120" | Dep
! width="120" align="center" | Etch
! width="120" | Etch
! width="120" align="center" | Dep
! width="120" | Dep
|-
|-
! Gas flow (sccm)  
! Gas flow (sccm)  
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|-
|-
! Cycles   
! Cycles   
|  
| colspan="2" | 11
|
| colspan="2" | 44
|
|-
|
! Common
| colspan="4" | Temperature 20 degs, HBC 10 torr, Short funnel, with baffle & 5mm spacers
|}
|}


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