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Specific Process Knowledge/Thin film deposition/Depositionof NbTi: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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!Generel description
!Generel description
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*Pulsed DC reactive sputtering
*DC/Pulsed DC
*Reactive HIPIMS (high-power impulse magnetron sputtering) (require 3-inch target)
*HIPIMS (high-power impulse magnetron sputtering) (require 3-inch target)
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*Reactive DC sputtering (not tested)
*DC sputtering (not tested)
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!Stoichiometry
!Stoichiometry
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*Nb<sub>x</sub>T<sub>y</sub>N (Sputter-System Metal-Nitride(PC3))
*NbTi (Sputter-System Metal-Nitride(PC3))
Tunable composition
Tunable composition
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