Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/Silicon Nitride Etch: Difference between revisions

Revision as of 14:16, 28 July 2025 view source Prakus (talk \| contribs) NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 156 edits →Etch rate uniformity & etch rate Tag: Visual edit ← Older edit		Revision as of 14:17, 28 July 2025 view source Prakus (talk \| contribs) NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231 156 edits →Etch rate uniformity & etch rate Newer edit →
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	'''SRN (LPCVD) etch uniformity on 6″ wafer with ''Slowetch'' recipe'''		'''SRN (LPCVD) etch uniformity on 6″ wafer with ''Slowetch'' recipe'''