Specific Process Knowledge/Thin film deposition/Deposition of Niobium Nitride: Difference between revisions
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== Deposition of Niobium Nitride == | == Deposition of Niobium Nitride == | ||
Revision as of 19:26, 25 July 2025
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Deposition of Niobium Nitride
Deposition of ScN can only be done by reactive sputtering using Nb target.
The primary tool for this application is the Cluster-Based, multi-chamber high-vacuum sputtering deposition system, commonly referred to as the 'Cluster Lesker.' The operating process is thoroughly documented and described in detail.:
- Deposition of Niobium Nitride (NbN) using reactive p-DC sputtering in Sputter-System Metal-Nitride(PC3) Source 2 (3-inch target)
At the moment (July 2025) we have a 3-inch Nb target (0.250" thick) for PC1 and PC3.