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Specific Process Knowledge/Thin film deposition/Deposition of MoSi: Difference between revisions

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Molybdenum silicide is particularly attractive for optical coatings because co-sputtering Mo with Si allows precise control of MoSi stoichiometry—and, in turn, the film’s refractive index at the design wavelength.  
Molybdenum silicide is particularly attractive for optical coatings because co-sputtering Mo with Si allows precise control of MoSi stoichiometry—and, in turn, the film’s refractive index at the design wavelength.  


MoSi alloy can be deposited by DC co-sputtering in either Sputter-System Metal-Oxide (PC1) or Sputter-System Metal-Nitride (PC3)—collectively referred to as the Cluster Lesker. The process uses two 3-inch targets:
MoSi alloy can be deposited by DC co-sputtering in either [[Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system|Sputter-System Metal-Oxide(PC1)]] or [[Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system|Sputter-System Metal-Nitride (PC3)]]—collectively referred to as the Cluster Lesker. The process uses two 3-inch targets:


*Mo (unbonded)
*Mo (unbonded)

Revision as of 22:49, 16 July 2025

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Deposition of MoSi

Molybdenum silicide is particularly attractive for optical coatings because co-sputtering Mo with Si allows precise control of MoSi stoichiometry—and, in turn, the film’s refractive index at the design wavelength.

MoSi alloy can be deposited by DC co-sputtering in either Sputter-System Metal-Oxide(PC1) or Sputter-System Metal-Nitride (PC3)—collectively referred to as the Cluster Lesker. The process uses two 3-inch targets:

  • Mo (unbonded)
  • Si (indium-bonded)

Achieving the desired composition and optical properties requires careful tuning of three key parameters:

  • Magnetron power on each target
  • Substrate temperature
  • Deposition pressure

Below is a link summarizing process results obtained with the Metal-Oxide (PC1) system:

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