Specific Process Knowledge/Thermal Process/C1 Furnace Anneal-oxide: Difference between revisions
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==C1 Furnace Anneal Oxide== | ==C1 Furnace Anneal Oxide== | ||
[[Image: | [[Image:C1.JPG|thumb|300x300px|C2 Furnace Anneal Oxide: positioned in cleanroom 2]] | ||
C1 Furnace Anneal Oxide is a Tempress horizontal furnace for oxidation and annealing of silicon wafers. | C1 Furnace Anneal Oxide is a Tempress horizontal furnace for oxidation and annealing of silicon wafers. | ||