Specific Process Knowledge/Characterization/Stylus Profiler Measurement Uncertainty: Difference between revisions
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===How flat is a "flat" scan?=== | ===How flat is a "flat" scan?=== | ||
[[image:Si 6 in left_50umprsec_aveof2.png||right|thumb|Sample average of 2 scans of a blank, new 6" Si wafer made with the P17 Stylus Profiler.]] | |||
[[image:BlankSi 6in center-2-altlevel2.PNG||right|thumb|Sample scan of a blank, new 6" Si wafer made with the DektakXT Stylus Profiler.]] | |||
KLA, the manufacturer of the P17 profiler, provides some information on the flatness one can expect from the scans, some available in [https://www.kla.com/wp-content/uploads/KLA_AppNote_Stylus_2D_Stress.pdf this document]. From this we can expect a variation of up to 40 nm across a flat scan of 3 cm, which means the variation we have measured is not far beyond the presumably best-case scenario painted by the manufacturer (our tool could use some lubrication of the scan axes at the time of measurement). | KLA, the manufacturer of the P17 profiler, provides some information on the flatness one can expect from the scans, some available in [https://www.kla.com/wp-content/uploads/KLA_AppNote_Stylus_2D_Stress.pdf this document]. From this we can expect a variation of up to 40 nm across a flat scan of 3 cm, which means the variation we have measured is not far beyond the presumably best-case scenario painted by the manufacturer (our tool could use some lubrication of the scan axes at the time of measurement). | ||