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Specific Process Knowledge/Thermal Process/Oxidation/Dry oxidation C1 furnace: Difference between revisions

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{{cc-nanolab}}
<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>
=Dry Oxidation in the C1 furnace=
=Dry Oxidation in the C1 furnace=
The C1 furnace can be used for dry oxidation of 4" and 6" wafers.  
The C1 furnace can be used for dry oxidation of 4" and 6" wafers.  
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thermal_Process/Oxidation/Dry_oxidation_C1_furnace"