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==Deposition of PolySilicon using LPCVD==
==Deposition of PolySilicon using LPCVD==
DTU Nanolab has two furnaces for the deposition of [[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon | Polysilicon using Low Chemical Vapour Deposition]] (LPCVD).


DTU Nanolab has two furnaces for deposition of LPCVD (Low Chemical Vapour Deposition) polysilicon: A 6" furnace (installed in 2011) for deposition of standard polySi, amorphous polySi and boron doped polySi on 100 mm or 150 mm wafers and a 4" furnace (installed in 1995) for deposition of standard polySi, amorphous polySi, boron- and phosphorous doped polySi on 100 mm wafers. In LabManager the two furnaces are named "Furnace: LPCVD Poly-Si (4") (B4)" and "Furnace: LPCVD Poly-Si (6") (E2)", respectively.  
We have a 6" furnace (installed in 2011) for the deposition of standard polySi, amorphous polySi and boron doped polySi on 100 mm or 150 mm wafers and a 4" furnace (installed in 1995) for the deposition of standard polySi, amorphous polySi, boron- and phosphorous doped polySi on 100 mm wafers.  


*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Deposition of Polysilicon using the 4" Polysilicon Furnace|Deposition of Polysilicon using the 4" Polysilicon Furnace]]
In LabManager the two furnaces are named "Furnace: LPCVD Poly-Si (4") (B4)" and "Furnace: LPCVD Poly-Si (6") (E2)", respectively.
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Deposition of Polysilicon using the 6" Polysilicon Furnace|Deposition of Polysilicon using the 6" Polysilicon Furnace]]
 
*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Deposition using the 4" Polysilicon Furnace|Deposition of Polysilicon using the 4" Polysilicon Furnace]]
 
*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Deposition using the 6" Polysilicon Furnace|Deposition of Polysilicon using the 6" Polysilicon Furnace]]


==Deposition of Silicon using PECVD==
==Deposition of Silicon using PECVD==
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