Decommissioned Equipment: Difference between revisions
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* Thin Film Deposition | * Thin Film Deposition | ||
:*[[Specific Process Knowledge/Thin film deposition/Deposition of AlTi/AlTi deposition in PVD co-sputter co-evaporation|AlTi deposition in PVD co-sputter co-evaporation]] | :*[[Specific Process Knowledge/Thin film deposition/Deposition of AlTi/AlTi deposition in PVD co-sputter co-evaporation|AlTi deposition in PVD co-sputter co-evaporation]] | ||
:*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride/Deposition of low stress nitride using the 4" LPCVD nitride furnace|Deposition of low stress nitride using the 4" LPCVD nitride furnace]] | |||
* Thermal Process | * Thermal Process | ||