Decommissioned Equipment: Difference between revisions
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==Dry Etch Equipment== | ==Dry Etch Equipment== | ||
[[Specific Process Knowledge/Etch/RIE (Reactive Ion Etch)|RIE (Reactive Ion Etch)]] | * [[Specific Process Knowledge/Etch/RIE (Reactive Ion Etch)|RIE (Reactive Ion Etch)]] | ||
[[Specific Process Knowledge/Etch/Etching of Silicon/Si etch using RIE1 or RIE2|Si etch using RIE1 or RIE2]] | :* [[Specific Process Knowledge/Etch/Etching of Silicon/Si etch using RIE1 or RIE2|Si etch using RIE1 or RIE2]] | ||
:* [[Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using RIE1 or RIE2|SiO2 etch using RIE1 or RIE2]] | |||
:* [[Specific Process Knowledge/Etch/Etching of Silicon Nitride/Etch of Silicon Nitride using RIE|Etch of Silicon Nitride using RIE]] | |||
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==Deleted the Page???== | ==Deleted the Page???== | ||