Decommissioned Equipment: Difference between revisions
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* [[Specific Process Knowledge/Characterization/KLA-Tencor Surfscan 6420 | KLA-Tencor Surfscan 6420]] | * [[Specific Process Knowledge/Characterization/KLA-Tencor Surfscan 6420 | KLA-Tencor Surfscan 6420]] | ||
:(replaced by [[Specific Process Knowledge/Characterization/Particle Scanner Takano | Takano WM-7SR]]) | :(replaced by [[Specific Process Knowledge/Characterization/Particle Scanner Takano | Takano WM-7SR]]) | ||
==Lithography Equipment== | |||
[[Specific Process Knowledge/Lithography/Descum/PlasmaAsher1|PlasmaAsher1]] | |||
[[Specific Process Knowledge/Lithography/Descum/PlasmaAsher2|PlasmaAsher2]] | |||
==Thin Film Equipment== | |||
fsdfsad | |||
==Dry Etch Equipment== | |||
[[Specific Process Knowledge/Etch/RIE (Reactive Ion Etch)|RIE (Reactive Ion Etch)]] | |||
[[Specific Process Knowledge/Etch/Etching of Silicon/Si etch using RIE1 or RIE2|Si etch using RIE1 or RIE2]] | |||
==Deleted the Page???== | |||