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Specific Process Knowledge/Thin film deposition/Deposition of Molybdenum: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Reet (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
1,760 edits
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! Pre-clean
! Pre-clean
|Ar ion source
|Ar ion source
|RF Ar clean
|
|RF Ar clean
|RF Ar clean
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
! Layer thickness
! Layer thickness
|10Å to 0.2 µm*
|10Å to 600 nm *
|10Å to 500 Å
|10Å to 500 Å
|10Å to ? ''discuss with staff''
|10Å to at least 100 nm (discuss with staff)
|-
|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
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'''*'''  ''Depending on the amount of heating during Mo deposition, which we will discover during process development.''
'''*'''  ''Please send a request to us if you wish to deposit more than 600 nm (write to metal@nanolab.dtu.dk)''
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