Specific Process Knowledge/Thin film deposition/Furnace LPCVD Nitride: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page% | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20https://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Furnace_LPCVD_Nitride click here]''' | ||
[[Category: Equipment|Thin film F]] | [[Category: Equipment|Thin film F]] | ||
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'''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:''' | '''The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:''' | ||
[ | [https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=84 4" LPCVD nitride furnace (B2)] | ||
[ | [https://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=250 6" LPCVD nitride furnace (E3)] | ||
[https://labmanager.dtu.dk/d4Show.php?id=1926 Furnace computer manual] | [https://labmanager.dtu.dk/d4Show.php?id=1926 Furnace computer manual] | ||