Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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{| class="wikitable" | {| class="wikitable" | ||
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|[[File:thope.png|150px]] || [[File:pxshi.png|150px]] || [[File:elelop.png|150px]] || [[File:meenadh.png|150px]] | |[[File:thope.png|150px|link=""]] | ||
||[[File:pxshi.png|150px|link=""]] | |||
||[[File:elelop.png|150px|link=""]] | |||
||[[File:meenadh.png|150px|link=""]] | |||
||[[File:rawta.png|150px|link=""]] | |||
|- | |- | ||
|[mailto:thope@dtu.dk Thomas Pedersen] | |[mailto:thope@dtu.dk Thomas Pedersen] | ||
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|| [mailto:meenadh@dtu.dk Meena Dhankhar] | || [mailto:meenadh@dtu.dk Meena Dhankhar] | ||
Raith E-Line | Raith E-Line | ||
|| [mailto:rawta@dtu.dk Rawa Tanta] | |||
JEOL 9500 & Raith E-Line | |||
|} | |} | ||