Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions
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== Titanium etch == | |||
{| border="2" cellpadding="2" cellspacing="1" | |||
|+ '''Ti etch''' | |||
|- | |||
! Parameter | |||
! width="200" | Process 1 | |||
! width="200" | Process 2 | |||
|- | |||
! Cl<sub>2</sub> (sccm) | |||
| 30 | |||
| 30 | |||
|- | |||
! HBr (sccm) | |||
| - | |||
| - | |||
|- | |||
! Pressure (mTorr) | |||
| 3, Strike 3 secs @ 15 mTorr??? | |||
| 3 | |||
|- | |||
! Coil power (W) | |||
| 800 | |||
| 900 | |||
|- | |||
! Platen power (W) | |||
| 100 | |||
| 50 | |||
|- | |||
! Temperature (<sup>o</sup>C) | |||
| 20 | |||
| 20 | |||
|- | |||
! Spacers (mm) | |||
| 30 | |||
| 30 | |||
|- | |||
! Etch rate (nm/min) | |||
| 152 | |||
| 64 | |||
|- | |||
!AZ resist selectivity | |||
| 0.67 | |||
| 0.83 | |||
|- | |- | ||
|} | |} | ||