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Specific Process Knowledge/Thermal Process/C2 Furnace III-V oxidation: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Pevo (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
2,331 edits
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*Wet oxidation of III-V devices
*Annealing of different samples and sample materials
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!style="background:silver; color:black" align="center"|Performance
!style="background:silver; color:black" align="center"|Performance
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|style="background:LightGrey; color:black"|Process temperature
|style="background:LightGrey; color:black"|Process temperature
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*420 <sup>o</sup>C
*Up to 600 <sup>o</sup>C, temperature ramp rate up to 10 <sup>o</sup>C/s
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|style="background:LightGrey; color:black"|Process pressure
|style="background:LightGrey; color:black"|Process pressure
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|style="background:LightGrey; color:black"|Gasses on the system
|style="background:LightGrey; color:black"|Gasses on the system
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*N<sub>2</sub> (bubbler)
*N<sub>2</sub>
*N<sub>2</sub>
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