Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2: Difference between revisions
Line 5: | Line 5: | ||
! colspan="2" | Recipe | ! colspan="2" | Recipe | ||
! nano1.42 | ! nano1.42 | ||
! pxnano2 | ! colspan="2" | pxnano2 | ||
|- | |- | ||
! colspan="2"| Tool | ! colspan="2"| Tool | ||
| Pegasus | | Pegasus | ||
| ASE | | colspan="2" | ASE | ||
|- | |- | ||
! rowspan="6" align="center"| Parameters | ! rowspan="6" align="center"| Parameters | ||
| Gas | | Gas | ||
| C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 38 sccm | | C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 38 sccm | ||
| D: C<sub>4</sub>F<sub>8</sub> 50 sccm, SF<sub>6</sub> 50 sccm | |||
| E: SF<sub>6</sub> 50 sccm | |||
|- | |||
| Power | |||
| 800 W CP, 40 W PP | |||
| D: 500 W CP | |||
| E: 350 W CP, 30 W PP | |||
|- | |- | ||
| Pressure | | Pressure | ||
| 4 mTorr, Strike 3 secs @ 15 mTorr | | 4 mTorr, Strike 3 secs @ 15 mTorr | ||
| | | colspan="2" | 10 mTorr | ||
| | |||
|- | |- | ||
| Temperature | | Temperature | ||
| -20 degs | | -20 degs | ||
| colspan="2" | 20 degrees | |||
|- | |- | ||
| Hardware | | Hardware | ||
| 100 mm Spacers | | 100 mm Spacers | ||
| colspan="2" | ? | |||
|- | |- | ||
| Time | | Time | ||
| 120 secs | | 120 secs | ||
| colspan="2" | D: 3 secs, E: 5 secs, total 12 cycles, 96 secs | |||
|- | |- | ||
! rowspan="3" align="center"| Conditions | ! rowspan="3" align="center"| Conditions | ||
| Run ID | | Run ID | ||
| | | 2150 | ||
| colspan="2" | wf_2e09b_mar23 | |||
|- | |- | ||
| Conditioning | | Conditioning |
Revision as of 10:41, 23 May 2011
nano1.42 versus pxnano2
Recipe | nano1.42 | pxnano2 | ||
---|---|---|---|---|
Tool | Pegasus | ASE | ||
Parameters | Gas | C4F8 75 sccm, SF6 38 sccm | D: C4F8 50 sccm, SF6 50 sccm | E: SF6 50 sccm |
Power | 800 W CP, 40 W PP | D: 500 W CP | E: 350 W CP, 30 W PP | |
Pressure | 4 mTorr, Strike 3 secs @ 15 mTorr | 10 mTorr | ||
Temperature | -20 degs | 20 degrees | ||
Hardware | 100 mm Spacers | ? | ||
Time | 120 secs | D: 3 secs, E: 5 secs, total 12 cycles, 96 secs | ||
Conditions | Run ID | 2150 | wf_2e09b_mar23 | |
Conditioning | Sequence: Oxygen clean, MU tests, processes, no oxygen between runs | |||
Mask | 211 nm zep etched down to 82 nm |
-
The 30 nm trenches etched 120 seconds nano1.42
-
The 30 nm trenches etched 96 seconds pxnano2
-
The 60 nm trenches etched 120 seconds
-
The 60 nm trenches etched 96 seconds
-
The 90 nm trenches etched 120 seconds
-
The 90 nm trenches etched 96 seconds
-
The 120 nm trenches etched 120 seconds
-
The 120 nm trenches etched 96 seconds
-
The 150 nm trenches etched 120 seconds
-
The 150 nm trenches etched 96 seconds