Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2: Difference between revisions

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! colspan="2" | Recipe
! colspan="2" | Recipe
! nano1.42
! nano1.42
! pxnano2
! colspan="2" | pxnano2
|-
|-
! colspan="2"| Tool
! colspan="2"| Tool
| Pegasus
| Pegasus
| ASE
| colspan="2" | ASE
|-
|-
! rowspan="6" align="center"| Parameters
! rowspan="6" align="center"| Parameters
| Gas
| Gas
| C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 38 sccm
| C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<sub>6</sub> 38 sccm
| D: C<sub>4</sub>F<sub>8</sub> 50 sccm, SF<sub>6</sub> 50 sccm
| E: SF<sub>6</sub> 50 sccm
|-
| Power
| 800 W CP, 40 W PP
| D: 500 W CP
| E: 350 W CP, 30 W PP
|-
|-
| Pressure
| Pressure
| 4 mTorr, Strike 3 secs @ 15 mTorr
| 4 mTorr, Strike 3 secs @ 15 mTorr
|-
| colspan="2" | 10 mTorr
| Power
| 800 W CP, 40 W PP
|-  
|-  
| Temperature
| Temperature
| -20 degs
| -20 degs
| colspan="2" | 20 degrees
|-
|-
| Hardware
| Hardware
| 100 mm Spacers
| 100 mm Spacers
| colspan="2" | ?
|-
|-
| Time
| Time
| 120 secs
| 120 secs
| colspan="2" | D: 3 secs, E: 5 secs, total 12 cycles, 96 secs
|-
|-
! rowspan="3" align="center"| Conditions
! rowspan="3" align="center"| Conditions
| Run ID
| Run ID
| 2017
| 2150
| colspan="2" | wf_2e09b_mar23
|-
|-
| Conditioning
| Conditioning

Revision as of 10:41, 23 May 2011

nano1.42 versus pxnano2

Recipe nano1.42 pxnano2
Tool Pegasus ASE
Parameters Gas C4F8 75 sccm, SF6 38 sccm D: C4F8 50 sccm, SF6 50 sccm E: SF6 50 sccm
Power 800 W CP, 40 W PP D: 500 W CP E: 350 W CP, 30 W PP
Pressure 4 mTorr, Strike 3 secs @ 15 mTorr 10 mTorr
Temperature -20 degs 20 degrees
Hardware 100 mm Spacers ?
Time 120 secs D: 3 secs, E: 5 secs, total 12 cycles, 96 secs
Conditions Run ID 2150 wf_2e09b_mar23
Conditioning Sequence: Oxygen clean, MU tests, processes, no oxygen between runs
Mask 211 nm zep etched down to 82 nm