Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2: Difference between revisions

From LabAdviser
Jml (talk | contribs)
No edit summary
Jml (talk | contribs)
Line 2: Line 2:


{| border="2" cellpadding="2" cellspacing="1"  
{| border="2" cellpadding="2" cellspacing="1"  
|+ '''Recipe nano1.42'''
|-
|-
|
! nano1.42
! pxnano2
|-
! Tool
! Pegasus
! ASE
|-
! rowspan="6" align="center"| Recipe
! rowspan="6" align="center"| Recipe
| Gas
| Gas

Revision as of 10:29, 23 May 2011

nano1.42 versus pxnano2

nano1.42 pxnano2
Tool Pegasus ASE
Recipe Gas C4F8 75 sccm, SF6 38 sccm
Pressure 4 mTorr, Strike 3 secs @ 15 mTorr
Power 800 W CP, 40 W PP
Temperature -20 degs
Hardware 100 mm Spacers
Time 120 secs
Conditions Run ID 2017
Conditioning Sequence: Oxygen clean, MU tests, processes, no oxygen between runs
Mask 211 nm zep etched down to 82 nm