Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano142-pxnano2: Difference between revisions
New page: == nano1.42 versus pxnano2 == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe Sinano3.31''' |- ! rowspan="6" align="center"| Recipe | Gas | BCl<sub>3</sub> 5 sccm, HBR 15 sccm... |
|||
Line 2: | Line 2: | ||
{| border="2" cellpadding="2" cellspacing="1" | {| border="2" cellpadding="2" cellspacing="1" | ||
|+ ''' | |+ '''h''' | ||
|- | |- | ||
! rowspan="6" align="center"| Recipe | ! rowspan="6" align="center"| Recipe |
Revision as of 11:33, 19 May 2011
nano1.42 versus pxnano2
Recipe | Gas | BCl3 5 sccm, HBR 15 sccm |
---|---|---|
Pressure | 2 mTorr, Strike 3 secs @ 5 mTorr | |
Power | 900 W CP, 75 W PP | |
Temperature | 50 degs | |
Hardware | 100 mm Spacers | |
Time | 60, 120 and 180 secs | |
Conditions | Run ID | 452, 453 and 454 |
Conditioning | Sequence: Oxygen clean, MU tests, processes, no oxygen between runs | |
Mask | 190 nm zep |
-
The 30 nm trenches etched 120 seconds
-
The 60 nm trenches etched 120 seconds
-
The 90 nm trenches etched 120 seconds
-
The 120 nm trenches etched 120 seconds
-
The 150 nm trenches etched 120 seconds
-
The 30 nm trenches etched 96 seconds
-
The 60 nm trenches etched 96 seconds
-
The 90 nm trenches etched 96 seconds
-
The 120 nm trenches etched 96 seconds
-
The 150 nm trenches etched 96 seconds