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Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano10: Difference between revisions

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1,918 edits
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| align="center" style="background:#f0f0f0;"|'''Std'''
| align="center" style="background:#f0f0f0;"|'''Std'''
|-
|-
| ER||nm/min||239||281||306||320||328||295||36
| Etch rates||nm/min||239||281||306||320||328||295||36
|-
|-
| SA||degs||93||94||93||92||93||93||1
| Sidewall angle||degs||93||94||93||92||93||93||1
|-
|-
| base||nm/edge||-1||-5||-11||-9||-32||-11||12
| CD loss||nm/edge||-1||-5||-11||-9||-32||-11||12
|-
|-
| foot||nm/edge||-1||-5||-11||-9||-2||-5||5
| CD loss foot||nm/edge||-1||-5||-11||-9||-2||-5||5
|-
|-
| Bowing||||41||33||29||30||22||31||7
| Bowing||||41||33||29||30||22||31||7
|-
|-
| Curve||||-51||-50||-43||-39||-42||-45||5
| Curvature||||-51||-50||-43||-39||-42||-45||5
|-
|-
| zep||nm/min||||||||||||46||
| zep||nm/min||||||||||||46||
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