Specific Process Knowledge/Wafer cleaning: Difference between revisions
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===Masks=== | ===Masks=== | ||
Masks that have become dirty by dust particles or resist residues have to be cleaned in the 7-up (mask) bath before use. | Masks that have become dirty by dust particles or resist residues have to be cleaned in the 7-up (mask) bath before use. You can find more information [https://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Wafer_cleaning/7-up_%26_Piranha here]. | ||
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