Specific Process Knowledge/Thin film deposition: Difference between revisions
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[[/Deposition of NiV|NiV]] alloy <br/> | [[/Deposition of NiV|NiV]] alloy <br/> | ||
[[/Deposition of TiW|TiW]] alloy (10%/90% by weight) <br/> | [[/Deposition of TiW|TiW]] alloy (10%/90% by weight) <br/> | ||
[[/Deposition of MoSi|MoSi]] alloy (50%/50% by At.%) <br/> | |||
And an electroceramic: | And an electroceramic: | ||