Specific Process Knowledge/Lithography/nLOF: Difference between revisions
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===Solvent development=== | ===Solvent development=== | ||
Cross-linking negative resists have the potential to be developed using organic solvents instead of the normally used alkaline aqueous solutions. A | Cross-linking negative resists have the potential to be developed using organic solvents instead of the normally used alkaline aqueous solutions. A quick test of this was carried out by Thomas Anhøj @ DTU Nanolab, showing that nLOF 2020 could potentially be used for water-free lithography. | ||
A small report on the tests can be found here: [[media:nLOF_solventdev_2024.pdf|'''nLOF solvent development 2024''']]. | A small report on the tests can be found here: [[media:nLOF_solventdev_2024.pdf|'''nLOF solvent development 2024''']]. | ||