Specific Process Knowledge/Lithography/UVLithography: Difference between revisions

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-UV Lithography uses ultraviolet light to transfer a pattern from a photo-mask or a design file to a wafer coated with photoresist. The photoresist film is spin coated onto the wafers, the design is transferred to the resist by using an aligner, and subsequently the resist pattern is developed. DTU Nanolab houses a number of automatic or manual coaters, mask or maskless aligners, as well as automatic or semi-automatic developers.
+UV Lithography uses ultraviolet light to transfer a pattern from a photo-mask, or a digital design file, to a substrate coated with photoresist.
+The process has 3 main steps:
+# Coating the substrate with a photosensitive film
+# Transferring a pattern into the resist by exposing it with UV light through either a physical shadow mask or a digital version of a shadow mask
+# Developing the exposed resist to reveal the transferred pattern
+DTU Nanolab offers a number of automatic and manual coaters, mask or maskless exposure tools, as well as automatic or semi-automatic developers.
 = Getting started =