|
|
| Line 193: |
Line 193: |
| |} | | |} |
|
| |
|
|
| |
|
| |
| {| border="2" cellspacing="1" cellpadding="3" align="center"
| |
| ! Nominal line width
| |
| ! colspan="14" align="center"| Etched depths (nm)
| |
| |-
| |
| ! 30 nm
| |
| |198
| |
| |231
| |
| |147
| |
| |214
| |
| |163
| |
| |227
| |
| |185
| |
| |170
| |
| |295
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |-
| |
| !60 nm
| |
| |256
| |
| |308
| |
| |181
| |
| |305
| |
| |229
| |
| |253
| |
| |191
| |
| |185
| |
| |411
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |-
| |
| !90 nm
| |
| |259
| |
| |335
| |
| |195
| |
| |342
| |
| |255
| |
| |251
| |
| |222
| |
| |253
| |
| |566
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |-
| |
| !120 nm
| |
| |277
| |
| |346
| |
| |203
| |
| |357
| |
| |262
| |
| |257
| |
| |221
| |
| |278
| |
| |600
| |
| |
| |
| |
| |
| |
| |
| |-
| |
| !150 nm
| |
| |269
| |
| |341
| |
| |205
| |
| |369
| |
| |265
| |
| |262
| |
| |225
| |
| |280
| |
| |647
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |-
| |
| ! Nominal line width
| |
| ! colspan="14" align="center"| Etch rates in trenches (nm/min)
| |
| |-
| |
| !30 nm
| |
| |79
| |
| |77
| |
| |74
| |
| |71
| |
| |82
| |
| |151
| |
| |93
| |
| |57
| |
| |59
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |-
| |
| !60 nm
| |
| |102
| |
| |103
| |
| |91
| |
| |102
| |
| |115
| |
| |169
| |
| |96
| |
| |62
| |
| |82
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |-
| |
| !90 nm
| |
| |104
| |
| |112
| |
| |98
| |
| |114
| |
| |128
| |
| |167
| |
| |111
| |
| |84
| |
| |113
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |-
| |
| !120 nm
| |
| |111
| |
| |115
| |
| |102
| |
| |119
| |
| |131
| |
| |171
| |
| |111
| |
| |93
| |
| |120
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |-
| |
| !150 nm
| |
| |108
| |
| |114
| |
| |103
| |
| |123
| |
| |133
| |
| |175
| |
| |113
| |
| |93
| |
| |129
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |-
| |
| |
| |
| ! colspan="14" align="center"| zep mask parameters
| |
| |-
| |
| ! start (end)
| |
| | 110 (64)
| |
| | [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|178 (96)]]
| |
| | [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|180 (110)]]
| |
| | [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|180 (64)]]
| |
| | [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|180 (72)]]
| |
| | 110 (43)
| |
| | 110 (34)
| |
| | [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/180nmzep|180 (64)]]
| |
| | [[Specific Process Knowledge/Etch/ICP Metal Etcher/nanoetch/340nmzep|348 (53)]]
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |-
| |
| ! zep etch rate (nm/min)
| |
| | 18
| |
| | 27
| |
| | 35
| |
| | 39
| |
| | 54
| |
| | 45
| |
| | 38
| |
| | 39
| |
| | 59
| |
| |
| |
| |
| |
| |
| |
| |
| |
| |-
| |
| |}
| |
|
| |
|
|
| |
|
| *[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch|Nanoetch on DRIE-Pegasus]] | | *[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch|Nanoetch on DRIE-Pegasus]] |
| *[[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano1|1 - the first nanoetch]] | | *[[Specific Process Knowledge/Etch/ICP Metal Etcher/Sinano1|1 - the first nanoetch]] |
