Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 04 processing: Difference between revisions
| Line 77: | Line 77: | ||
| 4" Si wafer<br>Development: 60s in 1:4 AZ 351B | | 4" Si wafer<br>Development: 60s in 1:4 AZ 351B | ||
|- | |- | ||
<!-- | |||
|- | |- | ||
|-style="background:whitesmoke; color:black" | |-style="background:whitesmoke; color:black" | ||
| Line 89: | Line 89: | ||
| 4" Si wafer<br>Development: | | 4" Si wafer<br>Development: | ||
|- | |- | ||
--> | |||
|} | |} | ||
<br> | <br> | ||
| Line 125: | Line 125: | ||
| 4" mask plate with Cr<br>Development: 60s in 1:4 AZ 351B | | 4" mask plate with Cr<br>Development: 60s in 1:4 AZ 351B | ||
|- | |- | ||
<!-- | |||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
| Line 141: | Line 141: | ||
| 4" Si wafer<br>Development: 60s in 1:4 AZ 351B | | 4" Si wafer<br>Development: 60s in 1:4 AZ 351B | ||
|- | |- | ||
--> | |||
|} | |} | ||
<br> | <br> | ||