Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 04 processing: Difference between revisions
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The Vector mode will write structures line by line. Structures will have low edge roughness and there will be no stitching of long lines. However, write time of a given design will strongly depend on the number, shape, or size of structures. | The Vector mode will write structures line by line. Structures will have low edge roughness and there will be no stitching of long lines. However, write time of a given design will strongly depend on the number, shape, or size of structures. | ||
The exposure time is a function of the number of elements (lines) in the design and the stage velocity during exposure. While the maximum velocity of the stage is 200mm/s, Heidelberg recommend not to exceed 120mm/s, in order to avoid distortions due to acceleration effects. | |||
==Resolution== | ==Resolution== | ||