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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 04 processing: Difference between revisions

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The writing head of the Aligner: Maskless 04 moves only in the z-direction. Using a focusing system, the maskless aligner is able to do real-time autofocus. The defocus process parameter is used to compensate offsets in the focusing mechanism, and to optimize printing quality in different resists and varying thicknesses.
The writing head of the Aligner: Maskless 04 moves only in the z-direction. Using a focusing system, the maskless aligner is able to do real-time autofocus. The defocus process parameter is used to compensate offsets in the focusing mechanism, and to optimize printing quality in different resists and varying thicknesses.
<br/>The stage of the Aligner: Maskless 01 moves only in x and y. It has no theta-axis. All rotation during alignment is thus accomplished by transformation of the input design.
<br/>The stage of the Aligner: Maskless 04 moves only in x and y. It has no theta-axis. All rotation during alignment is thus accomplished by transformation of the input design.


==Raster mode==
==Raster mode==
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