Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 04 processing: Difference between revisions

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 ==Vector mode==
-The light source in Vector mode is a 120mW 405nm diode laser. The laser beam is focused onto the substrate through a lens(system). The size of the focused spot is controlled using a set of pinholes (1, 2, 5, 10, or 25µm). By moving the stage at a constant velocity while switching the laser on and off, the pattern represented in the design is exposed in the resist. The dose the resist will receive is a function of the output power of the laser, the size of the pinhole, and the velocity of the stage.
+The light source in Vector mode is a 120mW 405nm diode laser. The laser beam is focused onto the substrate through a lens(system). The size of the focused spot is controlled using a set of pinholes (1, 2, 5, 10, and 25µm). By moving the stage at a constant velocity while switching the laser on and off, the pattern represented in the design is exposed in the resist. The dose the resist will receive is a function of the output power of the laser, the size of the pinhole, and the velocity of the stage.
 =Process Parameters=