Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 04 processing: Difference between revisions

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 [[Image:WritingSpeedVSAreaDose.JPG|400x400px|thumb|The writing speed of Aligner: Maskless 04 as a function of the exposed area and the exposure dose]]
-The site acceptance test performed during the installation of the Aligner: Maskless 01 showed an exposure time/speed of 0.025 min/mm<sup>2</sup>, which is slightly lower than the 0.02 min/mm<sup>2</sup> given in the specifications. At such speeds, a full 4" design would take 2:30-3:15 hours to expose. In practice, we observe exposure times in excess of 2 hours for a full 4" design.
+The Raster mode will scan the entire exposure area and write with high fidelity and accuracy. The write time of a given design will only depend on the area and exposure dose, not on the number, shape, or size of structures in the area.
-The exposure time increases linearly with exposure dose and writing area. However, due to the stepped nature of the exposure, the exposure time as a function of fill factor is highly nonlinear. It takes the same time to expose a single pixel as an entire 300µm X 400µm writing field, so the exposure time depends on the number of addressed writing fields, rather than on the fill factor of the design. In practice, there will probably not be much variation in exposure time with fill factor. Exposure tests using a 50mm<sup>2</sup> design have shown that the exposure time increases linearly from 40s at 10mJ/cm<sup>2</sup>, to 257s at 1000mJ/cm<sup>2</sup>. The fill factor of the design is 39%, but ~80% of the area is addressed by the writing fields. Scaled to a full 4" wafer, the exposure time is estimated to 2:37 hours at a dose of 100mJ/cm<sup>2</sup>.
+The site acceptance test performed during the installation of the Aligner: Maskless 04 showed an exposure speed of 47mm<sup>2</sup>/min, which is slightly higher than the 40mm<sup>2</sup>/min given in the specifications. At such speeds, a full 4" design would take 2:45-3:15 hours to expose.
+The exposure time increases linearly with exposure dose and writing area. However, due to the stepped nature of the exposure, the exposure time as a function of fill factor is highly nonlinear. It takes the same time to expose a single pixel as the entire writing field, so the exposure time depends on the number of addressed writing fields, rather than on the fill factor of the design. In practice, there will probably not be much variation in exposure time with fill factor. Exposure tests have shown that the exposure speed is low for small areas, but reaches full speed at areas above 40x40mm<sup>2</sup>. The lower speed for small areas is probably due to the delay in exposure start caused by the generation of the data needed for the exposure (conversion). Exposure tests using a 25mm<sup>2</sup> design have shown that the exposure time increases linearly from 37s at 10mJ/cm<sup>2</sup>, to 252s at 2000mJ/cm<sup>2</sup>.
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 '''Vector mode'''
+The Vector mode will write structures line by line. Structures will have low edge roughness and there will be no stitching of long lines. However, write time of a given design will strongly depend on the number, shape, or size of structures.
 ==Resolution==