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Specific Process Knowledge/Lithography/Descum: Difference between revisions

Jehem (talk | contribs)
Jehem (talk | contribs)
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You can manipulate two different descum process development parameters: you can either change power or chamber pressure.
You can manipulate two different descum process development parameters: you can either change power or chamber pressure.


==Power setting testing==
==Power testing - AZ MiR 701==
[[image:AZMIR701_power_settings.png|400px|thumb|Descum results for different power settings]]
[[image:AZMIR701_power_settings.png|400px|thumb|Descum results for different power settings]]


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==Pressure setting testing==
==Pressure testing - AZ MiR 701==
[[image:AZMIR701_pressure_settings.png|400px|thumb|Descum results for different pressure settings]]
[[image:AZMIR701_pressure_settings.png|400px|thumb|Descum results for different pressure settings]]


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==Ashing of AZ 5214E resist==
==Pressure testing - AZ 5214E==
[[image:AZ5214E_pressure_settings.png|400px|thumb|Descum results for different pressure settings]]
[[image:AZ5214E_pressure_settings.png|400px|thumb|Descum results for different pressure settings]]