Specific Process Knowledge/Lithography/Strip: Difference between revisions
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===Process Information=== | ===Process Information=== | ||
Plasma asher 5 is identical to plasma asher 4, see resist strip processing for plasma asher 4 [[Specific_Process_Knowledge/Lithography/Strip#Process_gas_ratio_for_plasma_asher_4_&_5|here]]. | |||
'''Other processes specfic for plasma asher 5:'''<br> | |||
*[[Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using Plasma Asher |SiO<sub>2</sub> etch using Plasma Asher 1]] | *[[Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using Plasma Asher |SiO<sub>2</sub> etch using Plasma Asher 1]] | ||
*[[Specific Process Knowledge/Lithography/Descum#Plasma Asher 5|Descum using plasma asher 5]] | *[[Specific Process Knowledge/Lithography/Descum#Plasma Asher 5|Descum using plasma asher 5]] | ||