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| The user manual, risk assessment, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=530 LabManager] - '''requires login''' | | The user manual, risk assessment, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=530 LabManager] - '''requires login''' |
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| ===Process Information===
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| *[[Specific Process Knowledge/Lithography/Descum#Plasma Asher 4|Descum using plasma asher 4]]
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| '''Typical stripping parameters'''
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| *Resist: 1.5 µm AZ 5214E
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| *Substrate: 100 mm Si
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| *O<sub>2</sub>: 100 sccm
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| *N<sub>2</sub>: 100 sccm
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| *Pressure (DSC): 1.3 mbar
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| *Power: 1000 W
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| *Time (single wafer): 20 minutes
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| *Time (full boat): 90 minutes
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| The user manual, user APV, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=200 LabManager] - '''requires login'''
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| ===Process Information===
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| *[[Specific Process Knowledge/Lithography/Descum|Descum]]
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| <br clear="all" /> | | <br clear="all" /> |
