Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium/End point: Difference between revisions
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<gallery caption="S047676 7:43 min Cr etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="2"> | <gallery caption="S047676 7:43 min Cr etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="2"> | ||
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File: | File:20250213_04_droppoint.jpg | ||
File:20250213_04_endpoint.jpg | |||
</gallery> | </gallery> | ||