Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium/End point: Difference between revisions
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====Cr etch==== | ====Cr etch==== | ||
<gallery caption="S047676 47s 7:43 min Cr etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="2"> | The End point signal shows a drop after 295 s and I stopped the etch after 465 s giving '''170 s after the drop started'''.<gallery caption="S047676 47s 7:43 min Cr etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="2"> | ||
File:data 05 screen shot 02.jpg | File:data 05 screen shot 02.jpg | ||
File:data 05 screen shot 04.jpg | File:data 05 screen shot 04.jpg | ||