Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium/End point: Difference between revisions
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=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]= | =<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]= | ||
Made by | Made by Berit bghe @ DTU Nanolab | ||
=Using the standard Cr etch recipe I was etching through 100 nm Cr on a 150 mm wafer it an etch load of 50%= | =Using the standard Cr etch recipe I was etching through 100 nm Cr on a 150 mm wafer it an etch load of 50%= | ||