Specific Process Knowledge/Pattern Design: Difference between revisions
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====Alignment marks location==== | ====Alignment marks location==== | ||
For the [[ | For the mask aligners [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6-1|MA6-1]] and [[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6-2|MA6-2]] | ||
*The mask's alignment marks for 4inch process: | *The mask's alignment marks for 4inch process: | ||