Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch: Difference between revisions

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The nanoetch
The nanoetch
{| {{table}}
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|'''ER'''
| align="center" style="background:#f0f0f0;"|'''SA'''
| align="center" style="background:#f0f0f0;"|'''base'''
| align="center" style="background:#f0f0f0;"|'''foot'''
| align="center" style="background:#f0f0f0;"|'''Bowing'''
| align="center" style="background:#f0f0f0;"|'''Curve'''
|-
| ||nm/min||degs||nm/edge||nm/edge||||
|-
| 30||236||84,37759937||28||28||21||-30
|-
| 60||307||82,39788067||46||46||32||-27
|-
| 90||333||82,87498365||62||62||35||-18
|-
| 120||341||81,25383774||88||88||33||14
|-
| 150||339||80,29807321||103||103||36||16
|-
| Avg||311||82||65||65||31||-9
|-
| Std||44||2||30||30||6||22
|-
| zep||0||||||||||
|-
|
|}

Revision as of 12:35, 9 May 2011

Recipe nano1.0 nano1.1 nano1.2 nano1.3 nano1.21 nano1.4 nano1.41 nano1.42 nano1.43
C4F8 (sccm) 52 52 52 52 75 75 75 75 75
SF6 (sccm) 38 38 38 38 38 38 38 38 38
O2 (sccm) 0 0 0 0 0 0 0 0 0
Coil power (W) 800 (forward) 600 (forward) 800 (forward) 600 (forward) 800 (forward) 800 (forward) 800 (forward) 800 (forward) 800 (forward)
Platen power (W) 50 50 50 40 50 50 75 40 30
Pressure (mtorr) 4 4 4 4 4 4 4 4 4
Temperature (degs C) 10 10 -10 -10 -10 -20 -20 -20 -20
Process time (s) 120 120 120 120 120 120 120 120 120
Nominal line width Etched depths (nm)
30 nm
60 nm
90 nm
120 nm
150 nm
Nominal line width Etch rates in trenches (nm/min)
30 nm
60 nm
90 nm
120 nm
150 nm
Etch rates in zep resist (nm/min)
One point on wafer
Images Images Images Images Images Images Images Images Images Images

The nanoetch


' ER SA base foot Bowing Curve
nm/min degs nm/edge nm/edge
30 236 84,37759937 28 28 21 -30
60 307 82,39788067 46 46 32 -27
90 333 82,87498365 62 62 35 -18
120 341 81,25383774 88 88 33 14
150 339 80,29807321 103 103 36 16
Avg 311 82 65 65 31 -9
Std 44 2 30 30 6 22
zep 0