Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium: Difference between revisions
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<gallery caption="Etching lines in 100nm Cr with the Cr etch for 3:30 min with 500 nm DUV resist on a 22mmx22mm piece ''BGHE@Nanolab | <gallery caption="Etching lines in 100nm Cr with the Cr etch for 3:30 min with 500 nm DUV resist on a 22mmx22mm piece ''BGHE@Nanolab Jan 2023''" perrow="5" widths="400px" heights="300px"> | ||
File:s040321_02.jpg | File:s040321_02.jpg | ||
File:s040321_05.jpg | File:s040321_05.jpg | ||